The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2020

Filed:

Mar. 20, 2018
Applicant:

Kennametal Inc., Latrobe, PA (US);

Inventors:

Chen Chen, Latrobe, PA (US);

Zhenyu Liu, Greensburg, PA (US);

Peter Rudolf Leicht, Latrobe, PA (US);

Rodrigo Alejandro Cooper, Houston, TX (US);

Assignee:

KENNAMETAL INC., Latrobe, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/02 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/403 (2013.01); C23C 16/0272 (2013.01); C23C 16/52 (2013.01);
Abstract

CVD Alumina coating has been one of the most important materials for wear resistant application for many years. Recently, texture control in α-AlOhas attracted increasing attention due to the possibility to further improve the anisotropic properties such as thermal conductivity and mechanical properties. The influence of process parameters on textures is complex. In the present application, the influence of nucleation surface condition and HS on the texture in CVD α-AlOcoatings has been investigated. It has been shown that without the addition of HS, the crystal orientation in the AlOcoatings is primarily dominated by the nucleation surface condition, whereas the effect of reactant composition on texture is minimal. On the other hand, in the presence of HS during growth, reactant composition also plays an important role in affecting the crystal orientation. This effect is likely due to the strong interaction between the AlOsurface and the HS.


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