The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2020

Filed:

Dec. 03, 2015
Applicant:

Honeywell International Inc., Morris Plains, NJ (US);

Inventors:

Anna Liu, Shanghai, CN;

Linan Zhao, Shanghai, CN;

Kevin Lu, Shanghai, CN;

Assignee:

HONEYWELL INTERNATIONAL INC., Morris Plains, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41D 31/12 (2019.01); A41D 13/11 (2006.01); A62B 23/02 (2006.01); A62B 18/08 (2006.01);
U.S. Cl.
CPC ...
A62B 18/08 (2013.01); A41D 13/1161 (2013.01); A41D 13/1176 (2013.01); A41D 31/12 (2019.02); A41D 31/125 (2019.02); A62B 23/025 (2013.01); A41D 13/1138 (2013.01);
Abstract

Embodiments relate generally to absorbing elements in respiratory face masks. Applicants have developed a structure for respiratory masks that can both absorb moisture from the face (such as perspiration, as well as from condensed moisture in the breath), and maintain a low breath resistance (won't increase the breath resistance significantly). The structure may comprise an annular structure added to the respiratory masks for moisture management, wherein the annular structure comprises moisture absorbent materials. This structure may also be known as an absorbing element operable to absorb moisture effectively, provide a respiratory mask with improved moisture control characteristics, reduce fogging of a face shield or eyeglasses of the wearer, and reduce the amount of uncomfortable moisture buildup on the face of the wearer.


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