The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2020

Filed:

Sep. 20, 2019
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventor:

Younggil Kwon, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 27/32 (2006.01); H01L 51/56 (2006.01); H01L 51/50 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0007 (2013.01); H01L 27/3202 (2013.01); H01L 27/3209 (2013.01); H01L 27/3211 (2013.01); H01L 51/0005 (2013.01); H01L 51/0016 (2013.01); H01L 51/0018 (2013.01); H01L 51/504 (2013.01); H01L 51/5228 (2013.01); H01L 51/56 (2013.01); H01L 27/3246 (2013.01); H01L 51/5253 (2013.01); H01L 51/5256 (2013.01); H01L 2251/5315 (2013.01);
Abstract

A method of manufacturing an organic light-emitting display apparatus including forming a liftoff layer containing a fluoropolymer on a substrate, forming a photoresist on the liftoff layer and patterning the photoresist by removing a portion thereof, etching, using a first solvent, the liftoff layer in a region where the photoresist is removed so that a portion of the liftoff layer remains on the substrate, forming an etch stop layer above the liftoff layer that remains on the substrate and above a region where the photoresist remains on the liftoff layer, and removing, using a second solvent, the liftoff layer under the region where the photoresist remains on the liftoff layer.


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