The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Apr. 12, 2018
Artilux, Inc., Menlo Park, CA (US);
Yun-Chung Na, Zhubei, TW;
Szu-Lin Cheng, Zhubei, JP;
Shu-Lu Chen, Zhubei, TW;
Han-Din Liu, Zhubei, TW;
Hui-Wen Chen, Zhubei, TW;
Che-Fu Liang, Zhubei, TW;
Yuan-Fu Lyu, Taoyuan, TW;
Chien-Lung Chen, Taoyuan, TW;
Chung-Chih Lin, Zhubei, TW;
Kuan-Chen Chu, Zhubei, TW;
Artilux, Inc., Menlo Park, CA (US);
Abstract
An optical apparatus that includes: a semiconductor substrate formed from a first material, the semiconductor substrate including a first n-doped region; and a photodiode supported by the semiconductor substrate, the photodiode including an absorption region configured to absorb photons and to generate photo-carriers from the absorbed photons, the absorption region being formed from a second material different than the first material and including: a first p-doped region; and a second n-doped region coupled to the first n-doped region, wherein a second doping concentration of the second n-doped region is less than or substantially equal to a first doping concentration of the first n-doped region.