The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Oct. 28, 2019
Applicant:
Peter F. Vandermeulen, Newburyport, MA (US);
Inventor:
Peter F. Vandermeulen, Newburyport, MA (US);
Assignee:
Other;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/14 (2006.01); H01J 37/05 (2006.01); H01J 37/08 (2006.01); H01J 37/147 (2006.01); H01J 37/317 (2006.01); H01L 31/20 (2006.01); H01L 31/18 (2006.01); H05H 1/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/14 (2013.01); H01J 37/05 (2013.01); H01J 37/08 (2013.01); H01J 37/147 (2013.01); H01J 37/3171 (2013.01); H01L 31/1804 (2013.01); H01L 31/206 (2013.01); H01J 37/32192 (2013.01); H01J 37/32412 (2013.01); H01J 2237/057 (2013.01); H01J 2237/0817 (2013.01); H01J 2237/14 (2013.01); H01J 2237/152 (2013.01); H01J 2237/31701 (2013.01); H01J 2237/31732 (2013.01); H05H 1/46 (2013.01); H05H 2001/4622 (2013.01);
Abstract
An ion beam treatment or implantation system includes an ion source emitting a plurality of parallel ion beams having a given spacing. A first lens magnet having a non-uniform magnetic field receives the plurality of ion beams from the ion source and focuses the plurality of ion beams toward a common point. The system may optionally include a second lens magnet having a non-uniform magnetic field receiving the ion beams focused by the first lens magnet and redirecting the ion beams such that they have a parallel arrangement having a closer spacing than said given spacing in a direction toward a target substrate.