The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2020

Filed:

Jul. 10, 2019
Applicant:

Headway Technologies, Inc., Milpitas, CA (US);

Inventors:

Yuhui Tang, Milpitas, CA (US);

Ying Liu, San Jose, CA (US);

Assignee:

Headway Technologies, Inc., Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/31 (2006.01); G11B 5/265 (2006.01); G11B 5/11 (2006.01); G11B 5/105 (2006.01); G11B 5/127 (2006.01); G11B 5/00 (2006.01); G11B 5/23 (2006.01);
U.S. Cl.
CPC ...
G11B 5/2655 (2013.01); G11B 5/105 (2013.01); G11B 5/11 (2013.01); G11B 5/1278 (2013.01); G11B 5/312 (2013.01); G11B 5/315 (2013.01); G11B 5/3133 (2013.01); G11B 5/3146 (2013.01); G11B 5/23 (2013.01); G11B 5/3153 (2013.01); G11B 2005/0021 (2013.01); G11B 2005/0024 (2013.01);
Abstract

A PMR (perpendicular magnetic recording) write head configured for microwave assisted magnetic recording (MAMR) includes a spin-torque oscillator (STO) and trailing shield formed of high moment magnetic material (HMTS). By patterning the STO and the HMTS in a simultaneous process the HMTS and the STO layer are precisely aligned and have very similar cross-track widths. In addition, the write gap at an off-center location has a thickness that is independent from its center-track thickness and the write gap total width can have a flexible range whose minimum value is the same width as the STO width.


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