The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2020

Filed:

Jan. 25, 2018
Applicant:

Cornell University, Ithaca, NY (US);

Inventors:

Amit Lal, Ithaca, NY (US);

Serhan Ardanuc, Ithaca, NY (US);

Jason T. Hoople, Ithaca, NY (US);

Justin C. Kuo, Ithaca, NY (US);

Assignee:

Cornell University, Ithaca, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B06B 1/06 (2006.01); G06N 3/04 (2006.01); B81B 3/00 (2006.01); G06K 9/00 (2006.01); G01S 7/521 (2006.01); G01S 15/02 (2006.01); G06N 3/063 (2006.01); H01J 49/02 (2006.01); G01S 15/89 (2006.01); G01S 7/52 (2006.01); H01H 1/00 (2006.01);
U.S. Cl.
CPC ...
G06N 3/04 (2013.01); B81B 3/0021 (2013.01); G01S 7/521 (2013.01); G01S 15/02 (2013.01); G06K 9/0002 (2013.01); G06N 3/0635 (2013.01); H01J 49/025 (2013.01); B81B 2201/018 (2013.01); B81B 2201/0214 (2013.01); B81B 2201/0285 (2013.01); B81B 2203/04 (2013.01); G01S 7/52079 (2013.01); G01S 15/8925 (2013.01); H01H 1/0094 (2013.01);
Abstract

Techniques, systems, and devices are described for implementing for implementing computation devices and artificial neurons based on nanoelectromechanical (NEMS) systems. In one aspect, a nanoelectromechanical system (NEMS) based computing element includes: a substrate; two electrodes configured as a first beam structure and a second beam structure positioned in close proximity with each other without contact, wherein the first beam structure is fixed to the substrate and the second beam structure is attached to the substrate while being free to bend under electrostatic force. The first beam structure is kept at a constant voltage while the other voltage varies based on an input signal applied to the NEMS based computing element.


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