The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2020

Filed:

Aug. 13, 2019
Applicant:

Alibaba Technology (Israel) Ltd., Herzliya, IL;

Inventors:

Matan Protter, Kiryat Ono, IL;

Motti Kushnir, Kiryat Ono, IL;

Felix Goldberg, Haifa, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 7/18 (2006.01); G06K 9/46 (2006.01); G06K 9/52 (2006.01); G06K 9/62 (2006.01); G06T 7/13 (2017.01); G06T 7/507 (2017.01);
U.S. Cl.
CPC ...
G06K 9/4661 (2013.01); G06K 9/4604 (2013.01); G06K 9/52 (2013.01); G06K 9/6215 (2013.01); G06K 9/6267 (2013.01); G06T 7/13 (2017.01); G06T 7/507 (2017.01);
Abstract

A method and a system for analyzing distinct light or radiation sources affecting a scene are provided. The method may include: sensing at least one image of a scene containing surfaces and objects, wherein the scene is illuminated by at least one distinct radiation or source; maintaining a database of the scene which stores approximate positions of at least some of the objects in the scene; identifying at least one candidate silhouette suspected to be cast by the at least one distinct light or radiation source, deriving properties of the at least one distinct light or radiation source, based on the at least one identified silhouette, based on data derived from the database.


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