The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Feb. 27, 2017
Applicant:
AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;
Inventors:
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/32 (2006.01); G03F 7/04 (2006.01); C08L 29/14 (2006.01); C08F 226/10 (2006.01); C08F 226/06 (2006.01); G03F 7/033 (2006.01); G03F 7/004 (2006.01); G03F 7/031 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); C08F 226/06 (2013.01); C08F 226/10 (2013.01); G03F 7/004 (2013.01); G03F 7/031 (2013.01); G03F 7/033 (2013.01); G03F 7/322 (2013.01); C08L 29/14 (2013.01);
Abstract
[Problem] To provide a composition for forming a fine pattern having a good pattern shape even after being applied to a thick-film resist, a high size reduction rate and less defects, as well as a method for forming a fine pattern using the same. [Means for Solution] A composition comprising vinyl resin, an amine compound having a specific cage-type three-dimensional structure and a solvent, and a method for forming a fine pattern using the same.