The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Dec. 09, 2019
Applicant:
Marsupial Holdings, Inc., Waitsfield, VT (US);
Inventors:
William P. Parker, Waitsfield, VT (US);
Julie Parker, Waitsfield, VT (US);
Assignee:
Marsupial Holdings, Inc., Waitsfield, VT (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/80 (2012.01); G03F 1/50 (2012.01); G03F 1/68 (2012.01); G03F 1/22 (2012.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/36 (2006.01);
U.S. Cl.
CPC ...
G03F 1/80 (2013.01); G03F 1/22 (2013.01); G03F 1/50 (2013.01); G03F 1/68 (2013.01); G03F 7/0005 (2013.01); G03F 7/2004 (2013.01); G03F 7/36 (2013.01);
Abstract
A method of fabricating a multi-tone amplitude photomask includes providing a mask substrate. The method includes providing a stepped pattern in at least one layer of material on a surface of the mask substrate. The stepped pattern includes at least two steps and at least three levels. Each level of the stepped pattern provides a different intensity of light when a light source shines light on the stepped pattern.