The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2020

Filed:

Sep. 28, 2016
Applicant:

Rohm and Haas Electronic Materials Korea Ltd., Cheonan, KR;

Inventors:

Yeonok Kim, Hwaseong, KR;

Seok-Bong Park, Yongin, KR;

Gyung-Sik Choi, Hwaseong, KR;

Su Min Lee, Hwaseong, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G02F 1/1339 (2006.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G02F 2001/13398 (2013.01);
Abstract

The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.


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