The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Dec. 17, 2018
Bae Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Yannick C. Morel, Falls Church, VA (US);
Peter A. Budni, Nashua, NH (US);
Peter A. Ketteridge, Amherst, NH (US);
Michael L. Lemons, Antrim, NH (US);
BAE Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Abstract
The system and method for enhancing and suppressing radio frequency (RF) emissions in a laser induced plasma system using a second laser. A first igniter laser is used at short pulse widths and a second heater laser is used at longer pulse widths. By varying the energy of the heater laser and/or the timing of the arrival of the heater laser with respect to the igniter laser suppression and/or enhancement of the radio frequency (RF) emission from the induced plasma system is possible.