The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Sep. 26, 2017
Amorepacific Corporation, Seoul, KR;
Byoung Young Woo, Yongin-si, KR;
Ki-Wha Lee, Yongin-si, KR;
Jihae Lee, Yongin-si, KR;
Chang Soon Choi, Yongin-si, KR;
Miyoung Park, Yongin-si, KR;
Young-Ho Park, Yongin-si, KR;
Sarva Jayaprakash, Yongin-si, KR;
Sridhar Regati, Yongin-si, KR;
Mamidi Srinivas, Yongin-si, KR;
Krushnakant Patel, Yongin-si, KR;
M. Ramamohan, Yongin-si, KR;
AMOREPACIFIC CORPORATION, Seoul, KR;
Abstract
Disclosed in the present specification is a method capable of preparing N-[4-[(1R)-1-[[(R)-(1,1-dimethylethyl)sulfinyl]amino]ethyl]-2,6-difluorophenyl]-methanesulfonamide (INT028-2) with high optical purity, through the selection of Ellman-chiral auxiliaries and the recrystallization and separation of optical isomers. According to the above method, high-purity N-[4-[(1R)-1-[[(R)-(1,1-dimethylethyl)sulfinyl]amino]ethyl]-2,6-difluorophenyl]-methanesulfonamide with excellent quality can be produced at room temperature by improving cryogenic process conditions necessary for realizing high optical purity, and thus the trimming due to the process failure rate can be remarkably reduced.