The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Mar. 28, 2018
Applicant:

Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;

Inventors:

Martin Möhrle, Berlin, DE;

Michael Theurer, Berlin, DE;

Ariane Sigmund, Berlin, DE;

Ute Troppenz, Berlin, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/022 (2006.01); H01S 5/028 (2006.01); H01S 5/40 (2006.01); H01S 5/50 (2006.01); H01S 5/026 (2006.01); H01S 5/22 (2006.01); H01S 5/343 (2006.01); H01S 5/14 (2006.01); G02B 6/42 (2006.01); H01S 5/12 (2006.01); H01S 5/125 (2006.01);
U.S. Cl.
CPC ...
H01S 5/02268 (2013.01); H01S 5/026 (2013.01); H01S 5/0224 (2013.01); H01S 5/0281 (2013.01); H01S 5/02256 (2013.01); H01S 5/22 (2013.01); H01S 5/34306 (2013.01); H01S 5/4025 (2013.01); H01S 5/4031 (2013.01); H01S 5/50 (2013.01); G02B 6/4224 (2013.01); H01S 5/12 (2013.01); H01S 5/125 (2013.01); H01S 5/14 (2013.01); H01S 5/40 (2013.01);
Abstract

What is shown is a method for manufacturing a semiconductor light source. The semiconductor light source has a substrate and a layer sequence arranged above the substrate, the same having a light-emitting layer and an upper boundary layer arranged above the light-emitting layer. The layer sequence is patterned in order to form a light-emitting stripe for defining the semiconductor light source and an alignment stripe, extending in parallel thereto, as a horizontal alignment mark at the same time. Then, a cover layer is applied on the patterned layer sequence and a part of the cover layer is removed in order to expose the alignment stripe and expose a region of the layer sequence outside the light-emitting stripe and spaced apart from a light-entrance edge or a light-exit edge of the light-emitting stripe as a vertical alignment mark.


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