The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Dec. 30, 2019
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Kohji Kanamori, Seoul, KR;

Young-Hwan Son, Hwaseong-si, KR;

Byung-Kwan You, Seoul, KR;

Eun-Taek Jung, Seongnam-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); H01L 21/28 (2006.01); H01L 49/02 (2006.01); H01L 27/1157 (2017.01); H01L 29/66 (2006.01); H01L 21/56 (2006.01); H01L 21/764 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); H01L 21/565 (2013.01); H01L 21/764 (2013.01); H01L 21/76832 (2013.01); H01L 23/5329 (2013.01); H01L 27/1157 (2013.01); H01L 28/88 (2013.01); H01L 29/40117 (2019.08); H01L 29/4234 (2013.01); H01L 29/66833 (2013.01);
Abstract

A vertical memory device includes first, second and third impurity regions sequentially stacked in a first direction substantially perpendicular to an upper surface of a substrate, a gate electrode structure including gate electrodes spaced apart from each other in the first direction on the third impurity region, a channel extending through the gate electrode structure, the second and third impurity regions, and an upper portion of the first impurity region on the substrate in the first direction, and a charge storage structure covering a portion of an outer sidewall and a lower surface of the channel. The channel directly contacts a sidewall of the second impurity region.


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