The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Jan. 16, 2019
Applicant:

Sandisk Technologies Llc, Addison, TX (US);

Inventors:

Zhongli Ji, Shanghai, CN;

Ning Ye, San Jose, CA (US);

Tong Zhang, Palo Alto, CA (US);

Hem Takiar, Fremont, CA (US);

Yangming Liu, Shanghai, CN;

Assignee:

SANDISK TECHNOLOGIES LLC, Addison, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 23/00 (2006.01); H01L 23/31 (2006.01); H01L 27/11582 (2017.01); H01L 21/306 (2006.01); H01L 21/822 (2006.01); H01L 21/768 (2006.01); H01L 27/1157 (2017.01);
U.S. Cl.
CPC ...
H01L 24/96 (2013.01); H01L 21/30608 (2013.01); H01L 21/76832 (2013.01); H01L 21/8221 (2013.01); H01L 23/3171 (2013.01); H01L 27/1157 (2013.01); H01L 27/11582 (2013.01);
Abstract

A substrate semiconductor layer is attached to a carrier substrate through a sacrificial bonding material layer. A plurality of semiconductor dies included within continuous material layers are formed on a front side of the substrate semiconductor layer. Each of the continuous material layers continuously extends over areas of the plurality of semiconductor dies. A plurality of dicing channels is formed between neighboring pairs among the plurality of semiconductor dies by anisotropically etching portions of the continuous material layers located between neighboring pairs of semiconductor dies. The plurality of dicing channels extends to a top surface of the sacrificial bonding material layer. The sacrificial bonding material layer is removed selective to materials of surface portions of the plurality of semiconductor dies using an isotropic etch process. The plurality of semiconductor dies is singulated from one another upon removal of the sacrificial bonding material layer.


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