The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Mar. 15, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Tzu-Yen Hsieh, Hsinchu, TW;
Sidda Reddy Kurakula, Bangalore, IN;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32972 (2013.01); H01J 37/32862 (2013.01); H01J 37/32981 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01L 21/67253 (2013.01); H01L 22/26 (2013.01); H01J 37/321 (2013.01); H01J 2237/2441 (2013.01); H01J 2237/24507 (2013.01); H01J 2237/334 (2013.01);
Abstract
Methods for in-situ and real-time chamber condition monitoring is provided. For example, in one embodiment, for each wafer in a chamber, a frequency and wavelength of the free radicals in the chamber is monitored in-situ. The frequency and wavelength of the free radicals are associated with at least one selected chemical. The associated free radicals are compared to an index. The index includes a target range for each chemical in the at least one selected chemical.