The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Jun. 06, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventor:
Hari K. Ponnekanti, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); H01J 37/32009 (2013.01);
Abstract
The present disclosure generally relates to methods and apparatus for facilitating electrical feedthrough in plasma processing chambers. The apparatus includes an electrically insulating housing positioned on a backside of the substrate support to contain a secondary plasma therein. The secondary plasma facilitates an electrical connection between the substrate support and electrical power or ground located outside the processing chamber. The methods include utilizing a secondary plasma to electrically couple substrate support to and electrical power or ground located outside the processing chamber.