The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Oct. 29, 2015
Applicant:

Acacia Communications, Inc., Maynard, MA (US);

Inventors:

Diedrik Vermeulen, Somerville, MA (US);

Christopher Doerr, Middleton, NJ (US);

Assignee:

Acacia Communications, Inc., Maynard, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/42 (2006.01); G02B 6/125 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
G02B 6/423 (2013.01); G02B 6/12002 (2013.01); G02B 6/125 (2013.01); G02B 6/4251 (2013.01); G02B 2006/12097 (2013.01); G02B 2006/12147 (2013.01);
Abstract

Structures and methods for passively aligning a photonic die with a receiving substrate are described. Three alignment surfaces, having dimensions greater than a desired alignment accuracy, may be formed on the photonic die and used to passively and accurately align the photonic die to a receiving substrate in six degrees of freedom. Two of the three alignment surfaces on the photonic die may be formed in a single mask-and-etch process, while the third alignment surface may require no patterning or etching. Three complementary alignment surfaces on the receiving substrate may be formed in a single mask-and-etch process.


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