The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Jun. 01, 2017
Applicants:

The Wave Talk, Inc., Daejeon, KR;

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Inventors:

Young Dug Kim, Seongnam-si Gyeonggi-do, KR;

Jongchan Park, Cheongju-si Chungcheongbuk-do, KR;

Yongkeun Park, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/47 (2006.01); G02B 26/12 (2006.01); G01N 21/956 (2006.01); G02B 27/48 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01N 21/4788 (2013.01); G01N 21/9505 (2013.01); G01N 21/95607 (2013.01); G01N 21/95684 (2013.01); G02B 26/12 (2013.01); G02B 27/48 (2013.01); G01N 2021/479 (2013.01); G01N 2021/95615 (2013.01); G01N 2201/0668 (2013.01);
Abstract

According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data.


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