The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Dec. 06, 2018
Applicant:

Q'z Corporation, Kodaira, JP;

Inventor:

Hisao Hojoh, Kodaira, JP;

Assignee:

Q'z Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 21/10 (2006.01); G01L 9/00 (2006.01); G01L 21/00 (2006.01);
U.S. Cl.
CPC ...
G01L 21/10 (2013.01); G01L 9/00 (2013.01); G01L 9/008 (2013.01); G01L 21/00 (2013.01);
Abstract

A vacuum gauge includes an introduction tube, a diaphragm displaced by a gas to be measured that is introduced from the introduction tube, a piezoelectric element that has one end coupled to the diaphragm and is displaced along with the diaphragm, an inner structure to which a circumferential edge of the diaphragm and the other end of the piezoelectric element are secured and that is coupled to the introduction tube, and an airtight container to airtightly enclose the introduction tube and the inner structure. The inner structure, the introduction tube, and the diaphragm airtightly partition a space in the airtight container into a pressure introduction chamber to which the gas to be measured is introduced on one surface side of the diaphragm, and a reference pressure chamber on the other surface side of the diaphragm. the reference pressure chamber being set at a high vacuum that is lower than the pressure lower limit of the measurement gas.


Find Patent Forward Citations

Loading…