The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Sep. 05, 2018
Applicant:

Silcotek Corp., Bellefonte, PA (US);

Inventors:

Min Yuan, State College, PA (US);

James B. Mattzela, Port Matilda, PA (US);

David A. Smith, Bellefonte, PA (US);

Assignee:

SilcoTek Corp., Bellefonte, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/34 (2006.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01); C23C 16/30 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/345 (2013.01); C23C 16/045 (2013.01); C23C 16/308 (2013.01); C23C 16/45523 (2013.01); C23C 16/45557 (2013.01); C23C 16/56 (2013.01);
Abstract

Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.


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