The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Sep. 14, 2017
Applicant:
Directed Vapor Technologies International, Inc., Charlottesville, VA (US);
Inventors:
Derek Hass, Charlottesville, VA (US);
Daniel Lobo, Charlottesville, VA (US);
Daniel Christy, Charlottesville, VA (US);
Assignee:
Other;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/32 (2006.01); H01M 10/052 (2010.01); C23C 14/06 (2006.01); C23C 14/30 (2006.01); C23C 14/00 (2006.01); H01M 10/0562 (2010.01); C23C 14/22 (2006.01);
U.S. Cl.
CPC ...
C23C 14/32 (2013.01); C23C 14/0021 (2013.01); C23C 14/06 (2013.01); C23C 14/0676 (2013.01); C23C 14/228 (2013.01); C23C 14/30 (2013.01); H01M 10/052 (2013.01); H01M 10/0562 (2013.01); H01M 2300/0068 (2013.01);
Abstract
A method is disclosed, which can comprise via a transonic gas jet, depositing a thin film of LiPON on a substrate via a directed vapor deposition process. The transonic gas jet transports a thermally evaporated vapor cloud comprising the LiPON, wherein, the transonic gas jet comprises one of (a) substantially entirely nitrogen (N) gas; or (b) nitrogen (N) gas as a dopant in a concentration greater than 10% by volume in an inert carrier gas.