The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

May. 08, 2017
Applicant:

Ovd Kinegram Ag, Zug, CH;

Inventors:

Andreas Schilling, Hagendorn, CH;

Rene Staub, Hagendorn, CH;

Philipp Schuler, Morschach, CH;

Achim Hansen, Zug, CH;

Assignee:

OVD KINEGRAM AG, Zug, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/31 (2006.01); H01L 21/308 (2006.01); H01L 21/3065 (2006.01); G03F 7/30 (2006.01); G03F 7/20 (2006.01); G03B 35/24 (2006.01); G03B 25/02 (2006.01); G02B 30/27 (2020.01); G02B 3/06 (2006.01); G02B 3/00 (2006.01); B42D 25/45 (2014.01); B42D 25/445 (2014.01); B42D 25/42 (2014.01); B42D 25/373 (2014.01); B42D 25/351 (2014.01); B42D 25/328 (2014.01); B42D 25/324 (2014.01); B42D 25/41 (2014.01);
U.S. Cl.
CPC ...
B42D 25/445 (2014.10); B42D 25/324 (2014.10); B42D 25/328 (2014.10); B42D 25/351 (2014.10); B42D 25/373 (2014.10); B42D 25/41 (2014.10); B42D 25/42 (2014.10); B42D 25/45 (2014.10); G02B 3/0037 (2013.01); G02B 3/0043 (2013.01); G02B 30/27 (2020.01); G03B 25/02 (2013.01); G03B 35/24 (2013.01); H01L 21/308 (2013.01); H01L 21/3065 (2013.01); H01L 21/3081 (2013.01); H01L 21/3083 (2013.01); H01L 21/30655 (2013.01); H01L 21/31 (2013.01); H01L 21/311 (2013.01); H01L 21/31105 (2013.01); H01L 21/31111 (2013.01); G02B 3/06 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01);
Abstract

A method for producing a security element formed as a lenticular flip, including a micro-optical layer, a carrier substrate and an image layer, wherein the image layer includes n images for n=1 to i which are visible from an n-th observation angle allocated to the n-th image, and wherein n is at least 1. The images are imaged on a photoresist with parallel light in contact print or by means of projection. After the photoresist is developed, an image layer which includes the i images is present.


Find Patent Forward Citations

Loading…