The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Apr. 03, 2018
Applicants:

Leonhard Kurz Stiftung & Co. KG, Furth, DE;

Ovd Kinegram Ag, Zug, CH;

Inventors:

Rene Staub, Hagendorn, CH;

Ludwig Brehm, Adelsdorf, DE;

Patrick Kramer, Lauf, DE;

Rouven Spiess, Unterageri, CH;

Karin Forster, Oberasbach, DE;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B42D 25/445 (2014.01); B41M 1/18 (2006.01); B42D 25/405 (2014.01); B42D 25/415 (2014.01); B42D 25/43 (2014.01); B42D 25/29 (2014.01); B42D 25/45 (2014.01); B42D 25/324 (2014.01); B42D 25/328 (2014.01); B42D 25/364 (2014.01); B42D 25/373 (2014.01); B42D 25/378 (2014.01);
U.S. Cl.
CPC ...
B42D 25/445 (2014.10); B41M 1/18 (2013.01); B42D 25/29 (2014.10); B42D 25/324 (2014.10); B42D 25/328 (2014.10); B42D 25/364 (2014.10); B42D 25/373 (2014.10); B42D 25/378 (2014.10); B42D 25/405 (2014.10); B42D 25/415 (2014.10); B42D 25/43 (2014.10); B42D 25/45 (2014.10);
Abstract

A method for producing a multi-layer body, in particular a security element, in which a partial first layer or partial first layer system is produced on a substrate, wherein the partial first layer or partial first layer system is present in a first partial area and not in a second partial area. Subsequently, a partial second layer or partial second layer system is produced, wherein the partial second layer or partial second layer system is present in a third partial area and not in a fourth partial area, and wherein the third partial area overlaps with the first and second partial areas. Finally, the partial first layer or partial first layer system is structured as a mask using the partial second layer or partial second layer system.


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