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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10846457 B1

PDFFull Text
Date of Patent:
Nov. 24, 2020

Filed:

Jun. 04, 2019

Lithography system, simulation apparatus, and pattern forming method

Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Tomoyuki Matsuyama, Kuki, JP;

Shintaro Kudo, Ageo, JP;

Hirotaka Kohno, Saitama, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Leigh M Garbowski

Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/00 (2006.01); G06F 30/398 (2020.01); G03F 7/20 (2006.01); G03F 1/82 (2012.01); G03F 1/36 (2012.01); G03F 1/70 (2012.01); G06F 30/39 (2020.01); G06F 119/18 (2020.01); G06F 30/337 (2020.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 7/705 (2013.01); G03F 7/70125 (2013.01); G03F 7/70441 (2013.01); G03F 7/70483 (2013.01); G03F 7/70491 (2013.01); G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 1/82 (2013.01); G06F 30/337 (2020.01); G06F 30/39 (2020.01); G06F 2119/18 (2020.01);
Abstract

A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.

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