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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10845720 B1

PDFFull Text
Date of Patent:
Nov. 24, 2020

Filed:

May. 30, 2017

Mark detection apparatus, mark detection method, measurement apparatus, exposure apparatus, exposure method and device manufacturing method

Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Shigeki Egami, Tokyo, JP;

Yoshifumi Nakakoji, Kumagaya, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Jonathan M Hansen

Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/20 (2006.01); G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7088 (2013.01); G01B 11/00 (2013.01); G01B 11/002 (2013.01); G03F 7/20 (2013.01); G03F 7/70141 (2013.01); G03F 9/00 (2013.01);
Abstract

A mark detection apparatus is configured to detect a mark formed in a mark area of an object and has: a first optical system configured to emit a first measurement light to the mark area; a second optical system configured to irradiate the mark area with at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the first optical system; and a light receiver that configured to optically receive at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the second optical system.

Find Patent Forward Citations

Egami, Shigeki. (2020). Mark detection apparatus, mark detection method, measurement apparatus, exposure apparatus, exposure method and device manufacturing method (U.S. Patent No. 10845720). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10845720

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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