The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Nov. 16, 2017
Suss Microtec Photomask Equipment Gmbh & Co. KG, Sternenfels, DE;
SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG, Stermenfels, DE;
Abstract
A holder for receiving and for protecting one side of a photomask or a photomask with pellicle from a cleaning medium, a method for cleaning such a photomask and an apparatus for opening and closing a holder are disclosed. The holder comprises a base having at least three support elements, which are arranged for receiving and for holding the photomask or the photomask with pellicle spaced from the bottom surface of the base, a sealing frame having an upper side and a lower side, wherein the lower side may be seated onto the base, and wherein the sealing frame comprises a centre opening, which is sized such that it may receive the photomask in a spaced manner. A circumferential, elastic sealing element is provided on the sealing frame, which extends from the inner circumference of the centre opening into the centre opening in an inclined manner towards the upper side of the sealing frame, wherein the sealing element in a no load condition has an inner circumference, which is smaller than the outer circumference of the photomask, and in a load condition circumferentially contacts a photomask, which is received in the centre opening, at its side surface.