The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Dec. 20, 2018
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Raluca Tiron, Saint Martin le Vinoux, FR;
Guillaume Claveau, Saint Martin de Bernegoue, FR;
Ahmed Gharbi, Grenoble, FR;
Laurent Pain, Saint Nicolas de Macherin, FR;
Xavier Chevalier, Grenoble, FR;
Christophe Navarro, Bayonne, FR;
Anne Paquet, Annecy-le-Vieux, FR;
Abstract
A method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method includes forming on a substrate a functionalisation layer made of a first polymer material having a first chemical affinity with respect to the block copolymer; forming on the substrate guiding patterns made of a second polymer material having a second chemical affinity with respect to the block copolymer, different from the first chemical affinity, and wherein the guiding to patterns have a critical dimension of less than 12.5 nm and are formed by means of a mask comprising spacers.