The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Sep. 21, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Jung Sun You, Daejeon, KR;
Dong Ho Ko, Daejeon, KR;
Hyo Jin Lee, Daejeon, KR;
In Ju Mun, Daejeon, KR;
Nam Gyu Kim, Daejeon, KR;
Hyun Jun Lee, Daejeon, KR;
Assignee:
LG Chem, Ltd., , KR;
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1341 (2006.01); G02F 1/1343 (2006.01); G02F 1/1337 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1341 (2013.01); G02F 1/133305 (2013.01); G02F 1/133711 (2013.01); G02F 1/133784 (2013.01); G02F 1/134309 (2013.01); G02F 2001/13415 (2013.01); G02F 2202/043 (2013.01);
Abstract
A method for manufacturing an optical device and an optical device is provided. The manufacturing method is capable of minimizing or eliminating dotting unevenness that may occur when an optical device is manufactured by a dotting process. In particular, even when a large cell gap is present or a polymer substrate is applied as a substrate so that high-temperature heat treatment is impossible, such method of the present application can provide an alignment film having improved orientation by improving the dotting unevenness.