The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2020

Filed:

Mar. 30, 2015
Applicant:

Rolic Ag, Zug, CH;

Inventors:

Klaus Schmitt, Lorrach, DE;

Hubert Seiberle, Weil am Rhein, DE;

David Pires, Allschwil, CH;

Assignee:

ROLIC AG, Zug, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G02B 30/25 (2020.01); G02B 30/27 (2020.01); B42D 25/364 (2014.01); B42D 25/445 (2014.01); B29D 11/00 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3016 (2013.01); B29D 11/00644 (2013.01); B42D 25/364 (2014.10); B42D 25/445 (2014.10); G02B 5/3083 (2013.01); G02B 30/25 (2020.01); G02B 30/27 (2020.01); B29K 2105/0058 (2013.01); B29K 2995/0044 (2013.01);
Abstract

The invention provides a method for generation of an orientation pattern in a photo-alignable material using parallax optic. The invention further provides optical devices comprising a parallax optical element and an element with patterned optical anisotropic properties. Such devices have angular dependent, optically anisotropic properties, which are useful for various applications.


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