The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2020

Filed:

Nov. 20, 2018
Applicant:

Solenis Technologies, L.p., Wilmington, DE (US);

Inventors:

Davit E. Sharoyan, Hockessin, DE (US);

Fushan Zhang, Hockessin, DE (US);

Matthew John Barrett, Charlotte, NC (US);

Assignee:

SOLENIS TECHNOLOGIES, L.P., Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D21H 21/02 (2006.01); D21H 23/04 (2006.01); G06T 7/60 (2017.01); G06T 7/00 (2017.01); D21H 23/78 (2006.01); G06T 7/62 (2017.01);
U.S. Cl.
CPC ...
D21H 21/02 (2013.01); D21H 23/04 (2013.01); D21H 23/78 (2013.01); G06T 7/0006 (2013.01); G06T 7/60 (2013.01); G06T 7/62 (2017.01); G06T 2207/10056 (2013.01); G06T 2207/30124 (2013.01);
Abstract

A method of measuring hydrophobic contaminants in a pulp slurry or a papermaking system includes the steps of providing an aqueous paper mill sample, filtering the aqueous paper mill sample to produce a filtrate comprising particles, and collecting an image of the particles in a measured volume of the filtrate. The method also includes the steps of analyzing the image to determine a size and morphology of the particles in the measured volume of filtrate, identifying spherical particles having a size of from about 1 micron to about 20 microns in the measured volume of filtrate, and quantifying a number of the spherical particles having the size of from about 1 micron to about 20 microns in the measured volume of filtrate. This method is useful for papermakers for deposition diagnostics, prevention, and contaminant control treatment optimization.


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