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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10844476 B1

PDFFull Text
Date of Patent:
Nov. 24, 2020

Filed:

Sep. 16, 2016

Sputtering target material

Applicant:

Sanyo Special Steel Co., Ltd., Himeji, JP;

Inventors:

Hiroyuki Hasegawa, Himeji, JP;

Noriaki Matsubara, Himeji, JP;

Assignee:

Sanyo Special Steel Co., Ltd., Himeji, JP;

Attorney:

The Webb Law Firm

Primary Examiner:

Christopher S Kessler

Assistant Examiner:

Jiangtian Xu

Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22C 19/07 (2006.01); C22C 38/00 (2006.01); H01J 37/34 (2006.01); H01F 41/18 (2006.01); B22F 1/00 (2006.01); B22F 9/08 (2006.01); C22C 38/10 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); B22F 1/0011 (2013.01); B22F 9/08 (2013.01); C22C 19/07 (2013.01); C22C 38/00 (2013.01); C22C 38/002 (2013.01); C22C 38/10 (2013.01); C23C 14/34 (2013.01); H01F 41/183 (2013.01); H01J 37/3426 (2013.01); H01J 37/3429 (2013.01); B22F 1/00 (2013.01); B22F 2301/15 (2013.01); B22F 2301/35 (2013.01); B22F 2304/10 (2013.01);
Abstract

An object of the present invention is to reduce particles generated in sputtering, and in order to achieve such an object, there is provided a sputtering target material including in at. %: 10 to 50% of B; and the balance of at least one of Co and Fe, and unavoidable impurities, in which the intensity ratio [I [(CoFe)B]/I [(CoFe)B]] of the X-ray diffraction intensity [I [(CoFe)B]] of (CoFe)B (121) to the X-ray diffraction intensity [I [(CoFe)B]] of (CoFe)B (200), the intensity ratio [I (CoB)/I (CoB)] of the X-ray diffraction intensity [I (CoB)] of CoB (121) to the X-ray diffraction intensity [I (CoB)] of CoB (200), or the intensity ratio [I (FeB)/I (FeB)] of the X-ray diffraction intensity [I (FeB)] of FeB (121) to the X-ray diffraction intensity [I (FeB)] of FeB (200) is 1.50 or less.

Find Patent Forward Citations

Hasegawa, Hiroyuki. (2020). Sputtering target material (U.S. Patent No. 10844476). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10844476

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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