The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Jan. 10, 2018
Daicel Corporation, Osaka-shi, Osaka, JP;
Yuichi Sakanishi, Tokyo, JP;
DAICEL CORPORATION, Osaka, JP;
Abstract
Problem to be Solved To provide a composition that can efficiently remove a photoresist adhering to an edge portion and a back surface of a substrate, in a process of producing a mask which is used when the substrate is subjected to etching treatment to have an element, a circuit etc., formed thereon using the photoresist. Solution The composition for removing a resist of the present invention is a composition comprising a surfactant and a solvent, wherein the composition contains, as the surfactant, at least the following component (A). Component (A): a polyglycerol derivative represented by the following formula (a):RO—(CHOR)—R  (a)wherein n represents the number of the repeating units, and is an integer of 2 to 60; and Ridentically or differently represents a hydrogen atom, a Chydrocarbon group or a Cacyl group, provided that at least two of the (n+2) number of Rare Chydrocarbon groups and/or Cacyl groups.