The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Dec. 21, 2018
Applicant:
Soulbrain Co., Ltd., Seongnam-si, KR;
Inventors:
Jong Ho Park, Seongnam-si, KR;
Myeong Hoon Han, Seongnam-si, KR;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/04 (2006.01); H01L 21/3105 (2006.01); H01L 21/321 (2006.01); H01L 21/306 (2006.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
C09G 1/04 (2013.01); C09G 1/02 (2013.01); H01L 21/30625 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract
The present invention relates to a method for polishing an insulating film of a semiconductor element, comprising polishing an insulating film, which is formed by embedding a conductive pattern formed on a substrate, with a polishing slurry composition comprising a polishing agent including polishing particles; and a polishing additive composition comprising a dialkyldiallylammonium halide, a basic amino acid, a non-ionic surfactant, and a pH adjuster, thereby removing a step involved in the insulating film.