The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Aug. 24, 2016
Suss Microtec Photomask Equipment Gmbh & Co. KG, Sternenfels, DE;
Jörg Duda, Neulingen, DE;
Uwe Dietze, Austin, TX (US);
SUSS MICRO TEC PHOTOMASK EQUIPMENT GMBH & CO KG, Sternenfels, DE;
Abstract
An apparatus for applying a liquid medium irradiated with UV radiation onto a substrata includes a housing having an elongated chamber, at least one inlet opening, and a slit shaped outlet opening opposite the inlet opening. A tube element extends through the chamber and is at least partially transparent to UV radiation. A flow space symmetric with respect to a longitudinal center plane of the chamber is formed between the tube element and a wall of the chamber. The longitudinal center plane dissects the outlet opening in its middle such that the tube element extends into the slit shaped outlet opening to form two longitudinally extending outlet slits between the tube element and the housing. At least one UV-radiation source in the tube element is arranged to emit UV-radiation in the direction of the flow space and through the outlet slits.