The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Nov. 29, 2018
Institut National DE LA Recherche Scientifique, Quebec, CA;
Sylvain Fourmaux, Drummondville, CA;
Stéphane Payeur, Montreal, CA;
Jean-Claude Kieffer, Montreal, CA;
Abstract
A method and a system for laser pulse wavefront correction and focusing optimization for laser Wakefield interaction to accelerate electrons to high energy, and more generally for laser matter interaction where both far field and intermediate field optimization are important, allowing a robust wavefront correction and focusing optimization with a high-power laser system at its nominal laser pulse energy and laser pulse duration. The method comprises, after laser beam focusing by focusing optics, coupling an imaging unit to a wavefront sensor, thereby measuring the laser beam wavefront, and adjusting the measured laser beam wavefront to converge to a reference wavefront of the imaging unit using a spatial phase-modifying device.