The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2020

Filed:

May. 16, 2019
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Jui-Chun Chang, Hsinchu, TW;

Bo-Yuan Su, Tainan, TW;

Chien-Nan Liao, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/266 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0634 (2013.01); H01L 21/266 (2013.01); H01L 29/0649 (2013.01); H01L 29/66477 (2013.01); H01L 29/78 (2013.01);
Abstract

A semiconductor device includes a charge-absorbing structure disposed over a substrate; an insulating layer disposed over the charge-absorbing structure; a semiconductor layer disposed over the insulating layer; a plurality of first doped regions and a plurality of second doped regions disposed in the semiconductor layer, wherein the first doped regions and second doped regions extend in a first direction and are alternately arranged along a second direction that is different than the first direction, and the plurality of first doped regions and the plurality of second doped regions have different conductivity types; a source and a drain disposed respectively on opposite sides of the plurality of first doped regions and the plurality of second doped regions and extend in the second direction; and a gate disposed on the plurality of first doped regions and the plurality of second doped regions and extends in the second direction.


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