The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Mar. 22, 2019
Applicant:
Shenzhen China Star Optoelectronics Technology Co,. Ltd., Guangdong, CN;
Inventor:
Jiangjiang Song, Guangdong, CN;
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., Guangdong, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/56 (2006.01); H01L 27/32 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 27/322 (2013.01); H01L 51/5284 (2013.01); H01L 51/56 (2013.01); H01L 2251/105 (2013.01);
Abstract
A method of fabricating a color filter is provided. In the method of fabricating the color filter, a patterned sacrificial layer having a thickness difference is formed on a substrate such that a patterned black photosensitive spacing material layer is formed by a single-tone photomask or a half-tone photomask and has effects of an original black matrix, a main spacer, and a sub-spacer. Thus, production costs can be reduced and a high yield can be carried out.