The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Apr. 24, 2017
Applicant:
Raytheon Company, Waltham, MA (US);
Inventors:
Kezia Cheng, Lowell, MA (US);
Christopher J. MacDonald, Medford, MA (US);
Kamal Tabatabaie Alavi, Sharon, MA (US);
Adrian D. Williams, Methuen, MA (US);
Assignee:
Raytheon Company, Waltham, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/32 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/324 (2013.01); H01L 21/68735 (2013.01); H01L 21/68785 (2013.01);
Abstract
Apparatus and method for heating a wafer having semiconductor material. The apparatus includes: a chamber, a source of radiant heat; a source of gas; and a susceptor disposed in the chamber to receive and absorb heat radiated by the source of radiant heat; the susceptor having an opening therein to allow a flow of gas to pass from the source of gas to pass through an interior region of the susceptor and over the wafer.