The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Nov. 22, 2016
Applicant:
Nikon Corporation, Tokyo, JP;
Inventor:
Shane R. Palmer, Oro Valley, CA (US);
Assignee:
NIKON CORPORATION, , JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); H01L 21/308 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/34 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01); G03F 7/34 (2013.01); G03F 7/70291 (2013.01); G03F 7/70508 (2013.01);
Abstract
A method for transferring an actual workpiece pattern () to a workpiece () using a pixelated phase mask () includes (i) evaluating a desired workpiece pattern () to identify a desired repetitive step cell () in the desired workpiece pattern (), the desired repetitive step cell () having a desired step cell width (), and a desired step cell length (); (ii) evaluating if the desired step cell width () is equal to a first integer multiplied by a pixel width (A) and an optical adjustment factor; and (iii) evaluating if the desired step cell length () is equal to a second integer multiplied by a pixel length (B) and an optical adjustment factor.