The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2020

Filed:

Jul. 14, 2017
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Takahiro Yamada, Kyoto, JP;

Masahiko Harumoto, Kyoto, JP;

Yuji Tanaka, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/02 (2006.01); B81C 1/00 (2006.01); H01L 21/67 (2006.01); G03F 7/40 (2006.01); H01L 21/311 (2006.01); H01L 21/687 (2006.01); B82Y 30/00 (2011.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); B81C 1/00 (2013.01); B82Y 30/00 (2013.01); G03F 7/40 (2013.01); H01L 21/02118 (2013.01); H01L 21/02345 (2013.01); H01L 21/0337 (2013.01); H01L 21/0338 (2013.01); H01L 21/31133 (2013.01); H01L 21/6715 (2013.01); H01L 21/67115 (2013.01); H01L 21/67126 (2013.01); H01L 21/67178 (2013.01); H01L 21/68742 (2013.01);
Abstract

A substrate on which a processing film made of a directed self-assembly material is formed is placed on a holding plate incorporating a preheating mechanism, and is preheated. A low oxygen atmosphere surrounds the substrate. A preheating temperature is a temperature at which the directed self-assembly material comprised of two types of polymers is phase-separated. By preheating the processing film, the two types of polymers are phase-separated to form a fine pattern. The processing film is irradiated with flashes of light from flash lamps while being preheated. This increases the fluidity of the polymers constituting the processing film to achieve the formation of a fine pattern while suppressing the occurrence of defects.


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