The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2020

Filed:

Jun. 25, 2019
Applicant:

V Technology Co., Ltd., Yokohama, JP;

Inventor:

Michinobu Mizumura, Yokohama, JP;

Assignee:

V Technology Co., Ltd., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/02 (2006.01); H01L 21/268 (2006.01); H01L 21/67 (2006.01); H01L 29/786 (2006.01); H01L 21/20 (2006.01); G02B 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02675 (2013.01); H01L 21/20 (2013.01); H01L 21/268 (2013.01); H01L 21/67115 (2013.01); H01L 29/786 (2013.01); G02B 3/0056 (2013.01);
Abstract

A laser irradiation device includes a light source that generates a laser beam, a projection lens that irradiates a predetermined region of an amorphous silicon thin film, mounted on each of a plurality of thin-film transistors on a glass substrate moving in a predetermined direction, with the laser beam, and a projection mask pattern provided on the projection lens and has a plurality of columns each including a predetermined number of opening portions and provided parallel to the predetermined direction, in which the projection lens emits the laser beam through the projection mask pattern, and the projection mask pattern is configured such that at least some of the predetermined number of opening portions are not on a straight line parallel to the predetermined direction in each of the plurality of columns.


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