The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10838294 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 17, 2020

Filed:

Nov. 21, 2017
Applicant:

Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, CN;

Inventor:

Shuanghua Zeng, Hubei, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02F 1/1333 (2006.01); G02F 1/13357 (2006.01); G02F 1/13 (2006.01); G03F 1/38 (2012.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G02F 1/1303 (2013.01); G02F 1/1333 (2013.01); G03F 7/20 (2013.01); G02F 2001/133357 (2013.01); G02F 2202/22 (2013.01);
Abstract

The application provides a mask disposed above a panel; the panel includes a planarization layer, and the planarization layer includes a plurality of trenches, the planarization layer is coated with a layer of TITO; the mask is provided with transparent regions, semi-transparent regions and opaque regions; the transparent regions are respectively arranged on the periphery of the display area and the semi-transparent regions are respectively arranged on the area directly above the trenches on the periphery of the display area; the opaque regions are respectively disposed directly above on each place other than the trenches of the panel, the transparent regions guide the light to expose and remove the TITO in the trenches on the periphery of the display area, the semi-transparent regions weaken the light and exposes and removes the TITO in trenches of the display area, the opaque regions block the light to avoid the exposure of TITO.


Find Patent Forward Citations

Zeng, Shuanghua. (2020). Method for improving residual tito on the periphery of panel and mask (U.S. Patent No. 10838294). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10838294

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