The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2020

Filed:

Dec. 07, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Michiie Sakamoto, Tokyo, JP;

Akinori Hashiguchi, Tokyo, JP;

Shinobu Masuda, Tokyo, JP;

Tsuguhide Sakata, Machida, JP;

Tsutomu Shimada, Musashino, JP;

Akihiro Sakai, Yokohama, JP;

Kazuhiko Kato, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 9/47 (2006.01); G02B 21/26 (2006.01); G02B 21/34 (2006.01); G02B 27/40 (2006.01); G02B 21/24 (2006.01); G02B 21/36 (2006.01); H04N 5/445 (2011.01);
U.S. Cl.
CPC ...
G02B 21/26 (2013.01); G02B 21/241 (2013.01); G02B 21/34 (2013.01); G02B 21/368 (2013.01); G02B 27/40 (2013.01); H04N 5/445 (2013.01);
Abstract

A slide used for observation by a microscope includes a label area configured to arrange a label, a cover glass area configured to arrange an observation object and a cover glass, a position reference mark arranged in a vacant area between the label area and the cover glass area and configured to specify a reference position of the slide and an X-axis direction and a Y-axis direction that are orthogonal to each other, and focus reference marks in which a predetermined pattern is repetitively arranged along two opposing sides of four sides of a periphery of the cover glass area, the focus reference marks being configured to specify a Z-axis direction orthogonal to the X-axis direction and the Y-axis direction.


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