The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2020

Filed:

Dec. 13, 2016
Applicant:

Whirlpool Corporation, Benton Harbor, MI (US);

Inventors:

Adam Gary, Marco Island, FL (US);

Keeley Kabala, North Liberty, IA (US);

Raghu Muddasani, Iowa City, IA (US);

Jeremiah S. Papke, North Liberty, IA (US);

Kyle Van Meter, Coralville, IA (US);

Scott Wesbrook, Cedar Rapids, IA (US);

Assignee:

Whirlpool Corporation, Benton Harbor, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F25D 11/02 (2006.01); F25D 21/04 (2006.01); F25D 17/06 (2006.01); F25D 17/04 (2006.01); F25D 29/00 (2006.01);
U.S. Cl.
CPC ...
F25D 21/04 (2013.01); F25D 11/02 (2013.01); F25D 17/047 (2013.01); F25D 17/062 (2013.01); F25D 17/065 (2013.01); F25D 29/00 (2013.01); F25B 2313/0312 (2013.01); F25B 2600/112 (2013.01); F25C 2400/10 (2013.01); F25D 2317/061 (2013.01); F25D 2317/062 (2013.01); F25D 2317/0666 (2013.01); F25D 2317/0682 (2013.01); F25D 2323/021 (2013.01); F25D 2700/00 (2013.01); Y02B 40/32 (2013.01);
Abstract

A refrigeration appliance includes a freezer compartment. An ice maker return duct fluidly couples an ice maker compartment and the freezer compartment. A pressure sensor is positioned within the freezer compartment and is configured to detect a pressure differential between the freezer compartment and an external environment. A fan is positioned within the ice maker return duct and is configured to be activated when the pressure within the freezer compartment is lower than the external environment.


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