The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Sep. 24, 2018
Samsung Electronics Co., Ltd., Suwon-si, KR;
Soojin Kim, Seoul, KR;
Hyo-Sun Lee, Hwaseong-si, KR;
Jung-Min Oh, Incheon, KR;
Hyosan Lee, Hwaseong-si, KR;
Donghyun Kim, Yongin-si, KR;
Haksoo Kim, Yongin-si, KR;
Jung Jae Oh, Yongin-si, KR;
Myung Ho Lee, Yongin-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
ENF Technology Co., Ltd., Youngin-si, KR;
Abstract
A pre-treatment composition for use before etching SiGe includes an acid, an alcohol, and a silane compound having a chemical formula R—Si(R)(OR)in which R is (C3-C20)alkyl, (C6-C12)aryl, (C6-C12)aryl(C3-C20)alkyl, or (C3-C20)alkyl(C6-C12)aryl, Ris hydrogen, hydroxyl, halogen, (C1-C20)alkyl, halo(C1-C20)alkyl, (C6-C12)aryl, (C6-C12)aryl(C1-C20)alkyl, or (C1-C20)alkyl(C6-C12)aryl, Ris hydrogen, (C1-C20)alkyl, halo(C1-C20)alkyl, (C6-C12)aryl, (C6-C12)aryl(C1-C20)alkyl, or (C1-C20)alkyl(C6-C12)aryl, n is an integer of 0 to 2, and the alkyl, aryl, arylalkyl, or alkylaryl of R, and the alkyl, haloalkyl, aryl, arylalkyl, or alkylaryl of Rmay be further substituted with at least one substituent selected from halogen, hydroxyl, —N(R)(R), and —S(R), where each of the R, the Rand the Ris independently hydrogen or (C1-C20)alkyl.