The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Jan. 12, 2015
Applied Materials, Inc., Santa Clara, CA (US);
Tommaso Vercesi, Aschaffenburg, DE;
Dieter Haas, San Jose, CA (US);
Stefan Bangert, Steinau, DE;
Oliver Heimel, Wabern, DE;
Daniele Gislon, Venice, IT;
Tommaso Vercesi, Aschaffenburg, DE;
Dieter Haas, San Jose, CA (US);
Stefan Bangert, Steinau, DE;
Oliver Heimel, Wabern, DE;
Daniele Gislon, Venice, IT;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.