The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Jun. 22, 2018
Applicant:
California Institute of Technology, Pasadena, CA (US);
Inventors:
David A. Boyd, La Cañada Flintridge, CA (US);
Nai-Chang Yeh, Pasadena, CA (US);
Assignee:
CALIFORNIA INSTITUTE OF TECHNOLOGY, Pasadena, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); C23C 16/26 (2006.01); C01B 32/184 (2017.01); C01B 32/186 (2017.01); C23C 16/44 (2006.01); C23C 16/511 (2006.01);
U.S. Cl.
CPC ...
C23C 16/26 (2013.01); C01B 32/184 (2017.08); C01B 32/186 (2017.08); C23C 16/4405 (2013.01); C23C 16/511 (2013.01); Y10T 428/24355 (2015.01);
Abstract
A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber. The method further includes subjecting the substrate to a flow of the cleaning gas and the carbon source for a predetermined period of time to form the graphene.