The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
May. 13, 2019
Applicant:
Far Eastern New Century Corporation, Taipei, TW;
Inventors:
Assignee:
FAR EASTERN NEW CENTURY CORPORATION, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/00 (2006.01); D01F 6/84 (2006.01); C08G 63/183 (2006.01); C08G 63/672 (2006.01); C08L 67/02 (2006.01); D01F 6/92 (2006.01); D01F 1/10 (2006.01);
U.S. Cl.
CPC ...
C08J 3/005 (2013.01); C08G 63/183 (2013.01); C08G 63/672 (2013.01); C08L 67/02 (2013.01); D01F 1/10 (2013.01); D01F 6/84 (2013.01); D01F 6/92 (2013.01); C08J 2367/02 (2013.01); C08J 2467/02 (2013.01);
Abstract
A copolyester resin for preparing a low-melting copolyester fiber is made by compounding a first copolyester with a second copolyester in a weight ratio of the first copolyester to the second copolyester of from 94:6 to 98:2. The first copolyester is obtained by subjecting terephthalic acid, ethylene glycol, isophthalic acid, and diethylene glycol to a copolymerization, and the second copolyester is obtained by subjecting terephthalic acid, ethylene glycol, and neopentyl glycol to another copolymerization.